QUANTITATIVE PHOTOEXCITATION STUDY OF SIH4 IN VACUUM ULTRAVIOLET

被引:73
作者
SUTO, M
LEE, LC
机构
关键词
D O I
10.1063/1.450506
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:1160 / 1164
页数:5
相关论文
共 22 条
[1]   ELECTRON-IMPACT SPECTROSCOPY OF SILANE AND GERMANE [J].
DILLON, MA ;
WANG, RG ;
WANG, ZW ;
SPENCE, D .
JOURNAL OF CHEMICAL PHYSICS, 1985, 82 (07) :2909-2917
[2]   ABSORPTION SPECTRUM OF FREE SIH2 RADICAL [J].
DUBOIS, I .
CANADIAN JOURNAL OF PHYSICS, 1968, 46 (22) :2485-&
[3]   SPECTRUM OF SIH2 [J].
DUBOIS, I ;
HERZBERG, G ;
VERMA, RD .
JOURNAL OF CHEMICAL PHYSICS, 1967, 47 (10) :4262-&
[4]   The far ultraviolet spectra of methylsilanes [J].
Harada, Y. ;
Murrell, J. N. ;
Sheena, H. H. .
CHEMICAL PHYSICS LETTERS, 1968, 1 (12) :595-596
[5]   LASER-INDUCED FLUORESCENCE OF THE SIH2 RADICAL [J].
INOUE, G ;
SUZUKI, M .
CHEMICAL PHYSICS LETTERS, 1984, 105 (06) :641-644
[6]   ORIGIN OF EMITTING SPECIES IN THE PLASMA DEPOSITION OF A-SI-H ALLOYS [J].
KAMPAS, FJ ;
GRIFFITH, RW .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) :1285-1288
[7]  
KERN W, 1978, THIN FILM PROCESSES, P257
[8]   HIGH-RESOLUTION ABSORPTION AND EMISSION-SPECTROSCOPY OF A SILANE PLASMA IN THE 1800-2300 CM-1 RANGE [J].
KNIGHTS, JC ;
SCHMITT, JPM ;
PERRIN, J ;
GUELACHVILI, G .
JOURNAL OF CHEMICAL PHYSICS, 1982, 76 (07) :3414-3421
[9]   FLUORESCENCE YIELD FROM PHOTO-DISSOCIATION OF CH4 AT 1060-1420-A [J].
LEE, LC ;
CHIANG, CC .
JOURNAL OF CHEMICAL PHYSICS, 1983, 78 (02) :688-691
[10]   OH(A2-SIGMA+-]X2-PI-I) YIELD FROM H2O PHOTO-DISSOCIATION IN 1050-1370 A [J].
LEE, LC .
JOURNAL OF CHEMICAL PHYSICS, 1980, 72 (08) :4334-4340