ON PHOTOOXIDATION OF GE IN OBLIQUELY DEPOSITED GE AND GE25S75, GE25SE75, GE25TE75 THIN-FILMS

被引：7

作者：

HARSHAVARDHAN, KS ^{[1
]}

HEGDE, MS ^{[1
]}

机构：

[1] INDIAN INST SCI,SOLID STATE & STRUCT CHEM UNIT,BANGALORE 560012,KARNATAKA,INDIA

来源：

SOLID STATE COMMUNICATIONS | 1989年 / 69卷 / 01期

关键词：

D O I：

10.1016/0038-1098(89)90039-2

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：117 / 120

页数：4

共 16 条

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