INITIAL EVAPORATION RATES FROM GAAS DURING RAPID THERMAL-PROCESSING

被引：17
|
作者：
HAYNES, TE [1 ]
CHU, WK [1 ]
ASELAGE, TL [1 ]
PICRAUX, ST [1 ]
机构：
[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87185
来源：
JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 04期
关键词：
D O I：
10.1063/1.339976
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1168 / 1176
页数：9
相关论文
共 50 条
  • [1] DIRECT MEASUREMENT OF EVAPORATION DURING RAPID THERMAL-PROCESSING OF CAPPED GAAS
    HAYNES, TE
    CHU, WK
    PICRAUX, ST
    APPLIED PHYSICS LETTERS, 1987, 50 (16) : 1071 - 1073
  • [2] TRANSIENT THERMAL-ANALYSIS FOR RAPID THERMAL-PROCESSING OF GAAS
    YANG, FK
    PIEN, SJ
    KWOR, R
    ADVANCES IN MATERIALS, PROCESSING AND DEVICES IN III-V COMPOUND SEMICONDUCTORS, 1989, 144 : 397 - 402
  • [3] EFFECTS OF RAPID THERMAL-PROCESSING ON MBE GAAS ON SI
    ITO, A
    KITAGAWA, A
    TOKUDA, Y
    USAMI, A
    KANO, H
    NOGE, H
    WADA, T
    RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING, 1989, 146 : 413 - 418
  • [4] MODELING OF DIFFUSION DURING RAPID THERMAL-PROCESSING
    RUSSO, C
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 530 : 106 - 113
  • [5] SIMULATION OF TEMPERATURE EFFECTS DURING RAPID THERMAL-PROCESSING
    KAKOSCHKE, R
    BUSSMANN, E
    RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING, 1989, 146 : 473 - 482
  • [6] POLYSILICON CAPACITOR FAILURE DURING RAPID THERMAL-PROCESSING
    MCGRUER, NE
    OIKARI, RA
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (07) : 929 - 933
  • [7] EFFECTIVE DIFFUSION TIME DURING RAPID THERMAL-PROCESSING
    ARBEL, A
    NATAN, M
    JOURNAL OF APPLIED PHYSICS, 1987, 61 (03) : 1209 - 1210
  • [8] MODELING OF WAFER HEATING DURING RAPID THERMAL-PROCESSING
    KAKOSCHKE, R
    BUSSMANN, E
    FOLL, H
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1990, 50 (02): : 141 - 150
  • [9] DEFECT GENERATION AND GETTERING DURING RAPID THERMAL-PROCESSING
    HARTITI, B
    MULLER, JC
    SIFFERT, P
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (01) : 96 - 104
  • [10] RAPID THERMAL-PROCESSING OF FILMS
    CELLER, GK
    JOURNAL OF METALS, 1985, 37 (08): : A23 - A23
12345