IMPURITY-SITE DISTRIBUTION OF IMPLANTED BI IN IRON AND NICKEL STUDIED BY CHANNELING AND NUCLEAR ORIENTATION

被引：15
作者：
CALLAGHAN, PT
KITTEL, P
STONE, NJ
JOHNSTON, PD
机构：
[1] UNIV OXFORD, NUCL PHYS LAB, OXFORD, ENGLAND
[2] UNIV OXFORD, CLARENDON LAB, MULLARD CRYOMAGNETIC LAB, OXFORD, ENGLAND
来源：
PHYSICAL REVIEW B | 1976年 / 14卷 / 09期
关键词：
D O I：
10.1103/PhysRevB.14.3722
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：3722 / 3731
页数：10
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