STUDY OF THE UNIFORMITY AND STOICHIOMETRY OF COSI2 FILMS USING RUTHERFORD BACKSCATTERING SPECTROSCOPY AND SCANNING ELECTRON-MICROSCOPY

被引：17

作者：

ISHIBASHI, K

FURUKAWA, S

机构：

来源：

APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 07期

关键词：

D O I：

10.1063/1.94437

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：660 / 662

页数：3

共 8 条

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[8] COBALT SILICIDE LAYERS ON SI .1. STRUCTURE AND GROWTH [J].

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