COMPENSATION EFFECT IN THERMALLY ACTIVATED PROCESSES

被引：104

作者：

PEACOCKLOPEZ, E ^{[1
]}

SUHL, H ^{[1
]}

机构：

[1] UNIV CALIF SAN DIEGO, INST PURE & APPL PHYS SCI, LA JOLLA, CA 92093 USA

来源：

PHYSICAL REVIEW B | 1982年 / 26卷 / 07期

关键词：

D O I：

10.1103/PhysRevB.26.3774

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：3774 / 3782

页数：9

共 23 条

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