BAND DISCONTINUITY IN GAAS/ALAS SUPERLATTICES WITH INAS STRAINED INSERTION-LAYERS

被引:1
|
作者
SAITO, T
HASHIMOTO, Y
IKOMA, T
机构
[1] Institute of Industrial Science, University of Tokyo, Minato-ku, Tokyo 100
[2] Department of Electrical Electronic Engineering, Faculty of Engineering, Shinshu University, Nagano 380
[3] Texas Instruments Tsukuba Research, Development Center Ltd., Tsukuba, Ibaraki 305
关键词
D O I
10.1006/spmi.1994.1078
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We have theoretically investigated the valence-band discontinuity (Delta(v)) at the (100) GaAs/AlAs interface with the InAs strained insertion-layer. The theoretical calculation is carried out by the self-consistent tight-binding method with the sp(3)s* basis in the (GaAs)(5)/(InAs)(1)/(AlAs)(5)/(InAs)(1) [100] superlattice. Delta E(v) at the GaAs/InAs(1ML)/AlAs interface is calculated to be 0.50 eV, which is practically equal to Delta E(v) = 0.51 eV at the GaAs/AlAs interface with no InAs layers. The insertion of the InAs monolayer changes the detail of valence charge density at the GaAs/AlAs interface but does not change Delta E(v). The result of calculation is in consistent with our experimental measurement by using the x-ray photoelectron spectroscopy.
引用
收藏
页码:405 / 407
页数:3
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