THERMAL-STABILITY OF PB-ALLOY JOSEPHSON JUNCTION ELECTRODE MATERIALS .6. EFFECTS OF FILM EDGES ON THE STRAIN DISTRIBUTION OF PB-BI COUNTER-ELECTRODES

被引:9
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MURAKAMI, M
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10.1063/1.331135
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O59 [应用物理学];
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页码:3560 / 3565
页数:6
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共 21 条
[1]  
ALECK BJ, 1949, J APPL MECH-T ASME, V16, P118
[2]   THERMAL-STABILITY OF PB-ALLOY JOSEPHSON JUNCTION ELECTRODE MATERIALS .4. EFFECTS OF CRYSTAL-STRUCTURE OF PB-BI COUNTER ELECTRODES [J].
BASSON, JH ;
MURAKAMI, M ;
BOOYENS, H .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) :337-345
[3]  
BLECH IA, 1980, IBM RC8247 RES REP
[4]  
BOOYENS H, 1981, IBM RC8637 RES REP
[5]   FABRICATION PROCESS FOR JOSEPHSON INTEGRATED-CIRCUITS [J].
GREINER, JH ;
KIRCHER, CJ ;
KLEPNER, SP ;
LAHIRI, SK ;
WARNECKE, AJ ;
BASAVAIAH, S ;
YEN, ET ;
BAKER, JM ;
BROSIOUS, PR ;
HUANG, HCW ;
MURAKAMI, M ;
AMES, I .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :195-205
[6]  
HOFFMAN RW, 1974, PHYSICS NONMETALLIC, P273
[7]  
HOUSKA CR, 1980, TREATISE MATERIALS A, V19, P63
[8]  
HU SM, 1979, J APPL PHYS, V50, P4661, DOI 10.1063/1.326575
[9]   LEAD ALLOY JOSEPHSON-JUNCTIONS WITH PB-BI COUNTERELECTRODES [J].
LAHIRI, SK ;
BASAVAIAH, S ;
KIRCHER, CJ .
APPLIED PHYSICS LETTERS, 1980, 36 (04) :334-336
[10]   RESIDUAL STRAINS OF PB THIN-FILMS DEPOSITED ONTO SI SUBSTRATES [J].
MURAKAMI, M .
ACTA METALLURGICA, 1978, 26 (01) :175-183