DISSOCIATIVE CHEMISORPTION OF NF3 AT SI(100) SURFACES

被引:0
|
作者
SHORTER, JA
LANGAN, JG
STEINFELD, JI
机构
关键词
D O I
暂无
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:L560 / L564
页数:5
相关论文
共 50 条
  • [41] HYDROGEN CHEMISORPTION ON 100 (2X1) SURFACES OF SI AND GE
    APPELBAUM, JA
    BARAFF, GA
    HAMANN, DR
    HAGSTRUM, HD
    SAKURAI, T
    SURFACE SCIENCE, 1978, 70 (01) : 654 - 673
  • [42] DIPOLE MOMENT OF NF3
    MASHIMA, M
    JOURNAL OF CHEMICAL PHYSICS, 1956, 24 (02): : 489 - 489
  • [43] NFSI IS NOT INCLUDED IN NF3
    Crabbe, Marcel
    JOURNAL OF SYMBOLIC LOGIC, 2016, 81 (03) : 948 - 950
  • [44] Smoothing single-crystalline SiC surfaces by reactive ion etching using pure NF3 and NF3/Ar mixture gas plasmas
    Tasaka, Akimasa
    Kotaka, Yuki
    Oda, Atsushi
    Saito, Morihiro
    Tojo, Tetsuro
    Inaba, Minoru
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (05):
  • [45] Molecular and dissociative chemisorption of NO on palladium and rhodium (100) and (111) surfaces: A density-functional periodic study
    Loffreda, D
    Simon, D
    Sautet, P
    JOURNAL OF CHEMICAL PHYSICS, 1998, 108 (15): : 6447 - 6457
  • [46] POTENTIAL FUNCTION OF NF3
    SCHATZ, PN
    JOURNAL OF CHEMICAL PHYSICS, 1958, 29 (03): : 481 - 483
  • [47] NF3 expansions abound
    不详
    CHEMICAL & ENGINEERING NEWS, 2000, 78 (29) : 16 - 16
  • [48] DIPOLE MOMENT OF NF3
    MASHIMA, M
    JOURNAL OF CHEMICAL PHYSICS, 1956, 25 (04): : 779 - 779
  • [49] The fusion temperature of NF3
    Ruff, O
    Menzel, W
    ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1934, 217 (01): : 93 - 94
  • [50] Electron ionization of NF3
    Rahman, M. A.
    Gangopadhyay, Sumona
    Limbachiya, Chetan
    Joshipura, K. N.
    Krishnakumar, E.
    INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 2012, 319 : 48 - 54