THERMODYNAMIC AND KINETIC-PROPERTIES OF INDIUM-IMPLANTED SILICON .2. HIGH-TEMPERATURE DIFFUSION IN AN INERT ATMOSPHERE

被引：14

作者：

CEROFOLINI, GF

FERLA, G

PIGNATEL, GU

RIVA, F

机构：

来源：

THIN SOLID FILMS | 1983年 / 101卷 / 03期

关键词：

D O I：

10.1016/0040-6090(83)90254-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：275 / 283

页数：9

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