COMPARISON OF HIGH SPATIAL-RESOLUTION IN EDX AND EELS ANALYSIS

被引：14

作者：

TITCHMARSH, JM

机构：

来源：

关键词：

D O I：

10.1016/0304-3991(89)90322-7

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：347 / 351

页数：5

共 10 条

[1]

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[2]

COLLIEX C, 1984, QUANTITATIVE ELECTRO, V25, P149

[3]

Goldstein JI, 1977, SCANNING ELECTRON MI, V1, P315

[4]

HALL EL, 1979, 37TH P ANN EMSA M SA, P474

MALIS, T ;

CHENG, SC ;

EGERTON, RF .

JOURNAL OF ELECTRON MICROSCOPY TECHNIQUE, 1988, 8 (02) :193-200

[6]

NORRIS DIR, 1987, MATERIALS NUCLEAR RE, P277

[7]

STEPHENSON TA, 1983, 41ST P ANN EMSA M PH, P370

[8]

TITCHMARSH JM, 1986, 11TH P INT C XRAY OP, P337

[9]

TITCHMARSH JM, 1986, RAD INDUCED SENSITIS, P74

[10]

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