FREE-CARRIER PLASMA EFFECTS IN ION-IMPLANTED AMORPHOUS LAYERS OF SILICON

被引：13
作者：
SPITZER, WG
WADDELL, CN
NARAYANAN, GH
FREDRICKSON, JE
PRUSSIN, S
机构：
[1] UNIV SO CALIF,DEPT PHYS,LOS ANGELES,CA 90007
[2] UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90007
[3] CALIF STATE UNIV LONG BEACH,DEPT PHYS & ASTRON,LONG BEACH,CA 90840
[4] TRW SEMICOND,LAWNDALE,CA 90260
来源：
APPLIED PHYSICS LETTERS | 1977年 / 30卷 / 12期
关键词：
D O I：
10.1063/1.89284
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：623 / 626
页数：4
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