PROCESS-CONTROL CAPABILITY USING A DIAPHRAGM PHOTOCHEMICAL DISPENSE SYSTEM

被引：0

作者：

CAMBRIA, TD

MERROW, SF

ZAHKA, J

机构：

[1] Millipore Corporation, Bedford, MA

来源：

MICROELECTRONIC ENGINEERING | 1991年 / 13卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(91)90152-4

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper describes methods and equipment which can be used to optimize the photochemical dispense process from a contamination and process control perspective. It describes the impact of point-of-use (POU) filtration on coating quality and gel removal; compares the performance of bellows and diaphragm pump designs with photoresist; and quantifies defect reduction studies using POU filtration of polyimide and spin-on-glass (SOG) photochemicals.

引用

页码：551 / 554

页数：4