LASER CHEMICAL VAPOR-DEPOSITION OF COPPER

被引：84
作者：
HOULE, FA
JONES, CR
BAUM, T
PICO, C
KOVAC, CA
机构：
来源：
APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 02期
关键词：
D O I：
10.1063/1.95685
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：204 / 206
页数：3
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