PREPARATION AND PROPERTIES OF REACTIVELY SPUTTERED TUNGSTEN-OXIDE FILMS

被引：35
作者：
KANEKO, H
MIYAKE, K
TERAMOTO, Y
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 04期
关键词：
D O I：
10.1063/1.331053
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：3070 / 3075
页数：6
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