ELECTRON-MICROSCOPY STUDY OF SPUTTERED CO-PT FILMS

被引：5
作者：
ISHIGURO, T
SATO, J
机构：
[1] Department of Electrical Engineering, Nagaoka University of Technology, Niigata, Kamitomioka-cho
[2] Nagaoka University of Technology, Tohoku Electric Power Company Incorporated
来源：
MATERIALS TRANSACTIONS JIM | 1994年 / 35卷 / 05期
关键词：
COBALT-PLATINUM THIN FILM; MAGNETIC RECORDING MEDIA; HIGH-RESOLUTION ELECTRON MICROSCOPY; X-RAY DIFFRACTION; STACKING DISORDER;
D O I：
10.2320/matertrans1989.35.319
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A microstructure analysis of CoxPt1-x(x=1.0 approximately 0.5) as-sputtered thin films has been performed. The detailed observation by high-resolution transmission electron microscopy (HRTEM) has been performed on films with 20 at%Pt showing the maximum coercivity. The obtained images have been compared with simulated images. The comparison reveales that each crystalline grain in the film has high density of stacking faults of close-packed atomic (CPA) layers. There is a compositional fluctuation in the normal direction of the CPA layer. These results are consistent with the results obtained from X-ray and electron diffraction analysis.
引用
收藏
页码：319 / 324
页数：6
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