INFLUENCE OF CU AS AN IMPURITY IN AL/TI AND AL/W THIN-FILM REACTIONS

被引：65

作者：

KRAFCSIK, I ^{[1
]}

GYULAI, J ^{[1
]}

PALMSTROM, CJ ^{[1
]}

MAYER, JW ^{[1
]}

机构：

[1] CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853

来源：

APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 11期

关键词：

D O I：

10.1063/1.94212

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1015 / 1017

页数：3

共 14 条

[1] REDUCTION OF ELECTROMIGRATION IN ALUMINUM FILMS BY COPPER DOPING [J].

AMES, I ;

DHEURLE, FM ;

HORSTMANN, RE .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (04) :461-+

[2]

Baglin J.E.E., 1978, THIN FILMS INTERDIFF

[3] ANALYTICAL STUDY OF PLATINUM SILICIDE FORMATION [J].

BINDELL, JB ;

COLBY, JW ;

WONSIDLER, DR ;

POATE, JM ;

CONLEY, DK ;

TISONE, TC .

THIN SOLID FILMS, 1976, 37 (03) :441-452

[4]

BOWER RW, 1973, APPL PHYS LETT, V23, P99, DOI 10.1063/1.1654823

[5]

Chu WK., 1978, BACKSCATTERING SPECT

[6]

GANGULEE A, 1974, JPN J APPL PHYS 1 S, V2, P621

[7]

GHATE PB, 1982, THIN SOLID FILMS, V93, P359, DOI 10.1016/0040-6090(82)90143-2

[8] OXYGEN IMPURITY EFFECTS AT METAL-SILICIDE INTERFACES - FORMATION OF SILICON-OXIDE AND SUBOXIDES IN THE NI-SI SYSTEM [J].

GRUNTHANER, PJ ;

GRUNTHANER, FJ ;

SCOTT, DM ;

NICOLET, MA ;

MAYER, JW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03) :641-648

[9] ANOMALOUS GROWTH OF HFAL3 IN THIN-FILMS [J].

LEVER, RF ;

HOWARD, JK ;

CHU, WK ;

SMITH, PJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :158-161

[10] DIFFUSION-BARRIERS IN LAYERED CONTACT STRUCTURES [J].

NICOLET, MA ;

BARTUR, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03) :786-793

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