SUSTAINING MECHANISMS IN RF PLASMAS

被引:23
作者
GILL, MD
机构
关键词
D O I
10.1016/0042-207X(84)90067-8
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:357 / 364
页数:8
相关论文
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BRUCE RH, 1980, 1980 P MICR ENG 80 I
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[6]  
FRANCIS G, 1960, IONIZATION PHENOMENA, P34
[8]   LANGMUIR PROBE STUDIES OF THE GLOW-DISCHARGE IN AN RF SPUTTERING SYSTEM AT VARIOUS FREQUENCIES [J].
NORSTROM, H .
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