COMPUTER-SIMULATIONS OF THE ION-IMPLANTATION PROCESS IN LAYERED MATERIALS

被引：18
作者：
CUI, FZ
LI, HD
ZHANG, JP
机构：
[1] ACAD SINICA,SHANGHAI INST MET,ION BEAM OPENING LAB,SHANGHAI,PEOPLES R CHINA
[2] CHINESE ACAD SCI,INST SEMICOND,BEIJING,PEOPLES R CHINA
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 21卷 / 2-4期
关键词：
D O I：
10.1016/0168-583X(87)90882-2
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：478 / 479
页数：2
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