EFFECT OF GE OVERLAYERS ON THE ELECTRICAL-RESISTANCE OF THIN CR FILMS

被引:5
作者
SCHRODER, K [1 ]
WALSH, L [1 ]
机构
[1] ROME AIR DEV CTR,GRIFFISS AFB,NY 13441
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 03期
关键词
D O I
10.1116/1.577367
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Cr films were prepared by evaporation on Corning glass plates. The base pressure of the vacuum system was in the 10(-9) to 10(-8) Torr range. The resistance R of the Cr films was measured at room temperature. The deposition of NaCl on a Cr film lead to practically no change in the resistance. However, Ge overlayers reduce R by about 10% for films about 10-nm thick. The maximum resistance decrease was found for a Cr film with a thickness of about 3 nm. There the Ge overlayer reduced R by nearly 40%. The resistance decrease due to Ge overlayers cannot be explained with conduction in the Ge overlayer. It seems also unlikely that one can contribute it to the formation of a compound at the interface between the Cr film and the Ge overlayer. It is suggested that the change in R may be associated with the exciton mechanism, but more work is required before we can understand the effect.
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页码:577 / 580
页数:4
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