THE ROLE OF ENERGETIC ION-BOMBARDMENT IN SILICON-FLUORINE CHEMISTRY

被引:24
作者
COBURN, JW
WINTERS, HF
机构
关键词
D O I
10.1016/0168-583X(87)90025-5
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:243 / 248
页数:6
相关论文
共 41 条
[1]  
BURTON RH, 1984, MATERIALS PROCESSING, V4, P79
[2]  
CHOW TP, 1984, MATERIALS PROCESSING, V4, P39
[3]   PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J].
COBURN, JW ;
WINTERS, HF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :391-403
[4]   PLASMA-ASSISTED ETCHING - ION-ASSISTED SURFACE-CHEMISTRY [J].
COBURN, JW ;
WINTERS, HF .
APPLICATIONS OF SURFACE SCIENCE, 1985, 22-3 (MAY) :63-71
[5]  
DIELEMAN J, 1984, SOLID STATE TECHNOL, V27, P191
[6]  
DONNELLY VM, 1981, SOLID STATE TECHNOL, V24, P161
[7]  
Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]
[8]  
FLAMM DL, 1984, VLSI ELECTRONICS MIC, V8, P189
[9]   PLASMA OXIDATION [J].
FROMHOLD, AT .
THIN SOLID FILMS, 1982, 95 (04) :297-308
[10]   ION-BEAM ASSISTED DEPOSITION OF METAL ORGANIC FILMS USING FOCUSED ION-BEAMS [J].
GAMO, K ;
TAKAKURA, N ;
SAMOTO, N ;
SHIMIZU, R ;
NAMBA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (05) :L293-L295