共 10 条
[1]
ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1989, 7 (03)
:883-893
[2]
BROWN SC, 1967, BASIC DATA PLASMA PH, P22
[3]
BUTTENCOURT JA, 1986, FUNDAMENTALS PLASMA, P418
[4]
COHEN SA, 1989, PLASMA ETCHING, P213
[5]
GUARNIERI CR, 1991, UNPUB 38TH NAT S AM
[6]
LANGMUIR PROBE MEASUREMENTS OF A RADIO-FREQUENCY INDUCTION PLASMA
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1993, 11 (01)
:152-156
[7]
Jackson J D, 1975, CLASSICAL ELECTRODYN, P298
[8]
KELLER J, 1989, UNPUB 39TH GAS EL C
[9]
KRALL NA, 1973, PRINCIPLES PLASMA PH, P48
[10]
Singer P. H., 1991, Semiconductor International, V14, P46