MODEL FOR THE VAPORIZATION OF MIXED ORGANOMETALLIC COMPOUNDS IN THE METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF HIGH-TEMPERATURE SUPERCONDUCTING FILMS

被引：21

作者：

MENG, GY

ZHOU, G

SCHNEIDER, RL

SARMA, BK

LEVY, M

机构：

[1] Department of Physics, University of Wisconsin-Milwaukee, Milwaukee

来源：

APPLIED PHYSICS LETTERS | 1993年 / 63卷 / 14期

关键词：

D O I：

10.1063/1.110621

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A model of the vaporization and mass transport of mixed organometallics from a single source for thin film metalorganic chemical vapor deposition is presented. A stoichiometric gas phase can be obtained from a mixture of the organometallics in the desired mole ratios, in spite of differences in the volatilities of the individual compounds. Proper film composition and growth rates are obtained by controlling the velocity of a carriage containing the organometallics through the heating zone of a vaporizer.

引用

页码：1981 / 1983

页数：3

共 7 条

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