GIANT MAGNETORESISTANCE IN ANTIFERROMAGNETIC CO/CU MULTILAYERS GROWN ON KAPTON

被引：34
|
作者：
PARKIN, SSP
ROCHE, KP
SUZUKI, T
机构：
[1] IBM Research Division, Almaden Research Center, San Jose, CA, 95120-6099
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1992年 / 31卷 / 9A期
关键词：
GIANT MAGNETORESISTANCE; MULTILAYERS; KAPTON SUBSTRATE; CO/CU(111) TEXTURE;
D O I：
10.1143/JJAP.31.L1246
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Multilayers of Co/Cu, sputter deposited onto thin kapton films, display very large room-temperature magnetoresistance, almost as large as that found in similar structures prepared on silicon wafers. Such flexible structures suggest a number of intriguing technological applications. Plane-view and cross section transmission electron micrographs reveal a high degree of structural order with grains extending over several hundred angstrom with sharp grain boundaries.
引用
收藏
页码：L1246 / L1249
页数：4
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