FORMATION OF HIGH ASYMMETRIC OXIDE TUNNELLING BARRIERS ON NIOBIUM AND TANTALUM

被引：5
作者：
HAHN, A
BRUNNER, M
EKRUT, H
机构：
来源：
THIN SOLID FILMS | 1983年 / 102卷 / 03期
关键词：
D O I：
10.1016/0040-6090(83)90089-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：221 / 230
页数：10
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