SURFACE-ANALYSIS OF GLASS IN THE ELECTRONICS INDUSTRY

被引：10

作者：

SMETS, BMJ

GOSSINK, RG

机构：

来源：

FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE | 1983年 / 314卷 / 03期

关键词：

D O I：

10.1007/BF00516821

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：285 / 288

页数：4

共 17 条

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[3]

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[4]

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WERNER, HW .

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[6] LIMITATIONS OF ION ETCHING FOR INTERFACE ANALYSIS [J].

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[7]

HUNT C, 1981, SURF INTERF ANAL, V3, P15

[8] OXYGEN OUTGASSING CAUSED BY ELECTRON BOMBARDMENT OF GLASS [J].

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[9]

LYDTIN H, 1979, ACTA ELECTRON, V22, P225

[10]

MACCAUGHAN D, 1973, PHYS REV LETT, V30, P614

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