DEFORMATION OCCURRING DURING DEPOSITION OF POLYCRYSTALLINE-SILICON FILMS

被引：20

作者：

KAMINS, TI ^{[1
]}

机构：

[1] FAIRCHILD CAMERA & INSTR CORP, RES & DEV LAB, PALO ALTO, CA 94304 USA

来源：

关键词：

D O I：

10.1149/1.2401887

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：681 / 684

页数：4

共 8 条

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[6] INTRINSIC STRESS IN EVAPORATED METAL FILMS [J].

KLOKHOLM, E ;

BERRY, BS .

MURBACH, HP ;

WILMAN, H .

PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (407) :905-910

[8]

VANAMSTE.JJ, 1967, PHILIPS TECH REV, V28, P57