INFLUENCE OF A HIGH-FREQUENCY DISCHARGE ON THE CHLORINATION OF NEODYMIUM OXIDE

被引：0
|
作者：
ZIMINA, ID
MIRONENKO, AI
ORLOVSKII, VP
SVETTSOV, VI
机构：
来源：
INORGANIC MATERIALS | 1985年 / 21卷 / 07期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：1085 / 1086
页数：2
相关论文
共 50 条
  • [1] HIGH-FREQUENCY DISCHARGE THROUGH NITRIC-OXIDE
    PRASAD, J
    DIXIT, SD
    GHOSH, SN
    ANNALES DE GEOPHYSIQUE, 1978, 34 (04): : 331 - 337
  • [2] SPRAYING OF OXIDE-FILMS IN GLOW HIGH-FREQUENCY DISCHARGE
    MILIYANCHUK, MV
    SAVITSKI.VG
    KOVTUN, RN
    DOROZHKO, EV
    SIVORONO.OA
    PRIBORY I TEKHNIKA EKSPERIMENTA, 1973, (01): : 242 - 244
  • [3] Initiation of the high-frequency discharge
    Thomson, J
    NATURE, 1935, 136 : 300 - 300
  • [4] Mechanism of high-frequency discharge
    Beck, H.
    ZEITSCHRIFT FUR PHYSIK, 1935, 97 (5-6): : 355 - 375
  • [5] AN INVESTIGATION OF HIGH-FREQUENCY DISCHARGE
    PATEIUK, GM
    SOVIET PHYSICS JETP-USSR, 1956, 3 (01): : 14 - 18
  • [6] High-frequency glow discharge
    van Dorsten, AC
    NATURE, 1933, 132 : 675 - 676
  • [7] STRATA IN A HIGH-FREQUENCY DISCHARGE
    RAKHIMOV, AT
    SUETIN, NV
    DOKLADY AKADEMII NAUK SSSR, 1982, 263 (02): : 341 - 344
  • [8] The Influence of High-Frequency Discharge on Substrate Temperature during Film Deposition
    V. B. Shirokov
    S. P. Zinchenko
    Technical Physics Letters, 2019, 45 : 478 - 480
  • [9] The Influence of High-Frequency Discharge on Substrate Temperature during Film Deposition
    Shirokov, V. B.
    Zinchenko, S. P.
    TECHNICAL PHYSICS LETTERS, 2019, 45 (05) : 478 - 480
  • [10] HIGH-FREQUENCY RESONANCE DISCHARGE IN A CYCLOTRON
    ZAGER, BA
    TISHIN, VG
    SOVIET PHYSICS-TECHNICAL PHYSICS, 1963, 8 (09): : 835 - &
12345