DEPENDENCE OF PHOTOETCHING RATES OF POLYMERS AT 193 NM ON OPTICAL-ABSORPTION DEPTH

被引：40

作者：

COLE, HS

LIU, YS

PHILIPP, HR

机构：

来源：

APPLIED PHYSICS LETTERS | 1986年 / 48卷 / 01期

关键词：

D O I：

10.1063/1.96767

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：76 / 77

页数：2

共 11 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J].

ANDREW, JE ;

DYER, PE ;

FORSTER, D ;

KEY, PH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :717-719

[2] SELF-DEVELOPING RESIST WITH SUBMICROMETER RESOLUTION AND PROCESSING STABILITY [J].

GEIS, MW ;

RANDALL, JN ;

DEUTSCH, TF ;

DEGRAFF, PD ;

KROHN, KE ;

STERN, LA .

APPLIED PHYSICS LETTERS, 1983, 43 (01) :74-76

[3] EXCIMER LASER PROJECTION PHOTOETCHING [J].

LATTA, M ;

MOORE, R ;

RICE, S ;

JAIN, K .

JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) :586-588

[4]

MIMURA Y, 1981, JPN J APPL PHYS, V20, P709

[5] OPTICAL PROPERTIES OF SEMICONDUCTORS [J].

PHILIPP, HR ;

EHRENREICH, H .

PHYSICAL REVIEW, 1963, 129 (04) :1550-&

[6]

PHILIPP HR, 1986, APPL PHYS LETT, V48

[7] ABLATIVE PHOTO-DECOMPOSITION - ACTION OF FAR ULTRAVIOLET (193-NM) LASER-RADIATION ON POLY(ETHYLENE-TEREPHTHALATE) FILMS [J].

SRINIVASAN, R ;

LEIGH, WJ .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1982, 104 (24) :6784-6785

[8] ABLATIVE PHOTODECOMPOSITION OF POLYMER-FILMS BY PULSED FAR-ULTRAVIOLET (193 NM) LASER-RADIATION - DEPENDENCE OF ETCH DEPTH ON EXPERIMENTAL CONDITIONS [J].

SRINIVASAN, R ;

BRAREN, B .

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1984, 22 (10) :2601-2609

[9] KINETICS OF THE ABLATIVE PHOTO-DECOMPOSITION OF ORGANIC POLYMERS IN THE FAR ULTRAVIOLET (193 NM) [J].

SRINIVASAN, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :923-926

[10] SELF-DEVELOPING PHOTOETCHING OF POLY(ETHYLENE-TEREPHTHALATE) FILMS BY FAR ULTRAVIOLET EXCIMER LASER-RADIATION [J].

SRINIVASAN, R ;

MAYNEBANTON, V .

APPLIED PHYSICS LETTERS, 1982, 41 (06) :576-578

← 1 2 →