GROWTH OF OXIDE LAYERS ON THIN ALUMINUM NITRIDE SAMPLES MEASURED BY ELECTRON-ENERGY-LOSS SPECTROSCOPY

被引:25
作者
STERNITZKE, M
机构
[1] Department of Materials Science, University of Darmstadt, Darmstadt
关键词
D O I
10.1111/j.1151-2916.1993.tb07766.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
AlN ceramics with different amounts of oxygen impurities were investigated by electron energy-loss spectroscopy (EELS). Because of the high dynamics of EEL spectra, a method was developed to record partial spectra and then to join them together to form a complete spectrum. The data obtained from EEL spectra were the nitrogen/oxygen concentration ratio, sample thickness, and energy-loss near-edge structures (ELNES). Because of spontaneous formation of an oxide layer on AlN samples immediately after ion milling, a method had to be developed which yielded the oxide layer thickness and the bulk oxygen content. The growth kinetics of the oxide layer were investigated by exposing the AlN samples at room temperature to air and to water for various times. From these measurements a logarithmic rate law for the oxidation of AlN at room temperature was obtained.
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页码:2289 / 2294
页数:6
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