INVESTIGATION OF CHEMICAL PROPERTIES OF STAIN FILMS ON SILICON BY MEANS OF INFRARED SPECTROSCOPY

被引：120
作者：
BECKMANN, KH
机构：
来源：
SURFACE SCIENCE | 1965年 / 3卷 / 04期
关键词：
D O I：
10.1016/0039-6028(65)90002-6
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
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页码：314 / &
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