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AN OPTICAL CHARACTERIZATION OF NATIVE OXIDES AND THIN THERMAL OXIDES ON SILICON
被引:46
作者
:
PHILIPP, HR
论文数:
0
引用数:
0
h-index:
0
PHILIPP, HR
TAFT, EA
论文数:
0
引用数:
0
h-index:
0
TAFT, EA
机构
:
来源
:
JOURNAL OF APPLIED PHYSICS
|
1982年
/ 53卷
/ 07期
关键词
:
D O I
:
10.1063/1.331401
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:5224 / 5229
页数:6
相关论文
共 18 条
[1]
MEASUREMENT OF OXYGEN ADSORPTION ON SILICON BYELLIPSOMETRY
ARCHER, RJ
论文数:
0
引用数:
0
h-index:
0
ARCHER, RJ
GOBELI, GW
论文数:
0
引用数:
0
h-index:
0
GOBELI, GW
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1965,
26
(02)
: 343
-
&
[2]
OPTICAL MEASUREMENT OF FILM GROWTH ON SILICON AND GERMANIUM SURFACES IN ROOM AIR
ARCHER, RJ
论文数:
0
引用数:
0
h-index:
0
ARCHER, RJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1957,
104
(10)
: 619
-
622
[3]
SPECTROSCOPIC ANALYSIS OF THE INTERFACE BETWEEN SI AND ITS THERMALLY GROWN OXIDE
ASPNES, DE
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
ASPNES, DE
THEETEN, JB
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
THEETEN, JB
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(06)
: 1359
-
1365
[4]
Berning PH, 1963, PHYS THIN FILMS, V1, P69
[5]
Heavens O.S, 1991, OPTICAL PROPERTIES T
[6]
SILICON CLEANING WITH HYDROGEN PEROXIDE SOLUTIONS - HIGH ENERGY ELECTRON DIFFRACTION AND AUGER ELECTRON SPECTROSCOPY STUDY
HENDERSON, RC
论文数:
0
引用数:
0
h-index:
0
HENDERSON, RC
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(06)
: 772
-
+
[7]
OXIDATION OF SI AND GAAS IN AIR AT ROOM-TEMPERATURE
LUKES, F
论文数:
0
引用数:
0
h-index:
0
LUKES, F
[J].
SURFACE SCIENCE,
1972,
30
(01)
: 91
-
&
[8]
PANTELIDES ST, 1978, PHYSICS SIO2 ITS INT
[9]
OPTICAL TRANSITIONS IN CRYSTALLINE AND FUSED QUARTZ
PHILIPP, HR
论文数:
0
引用数:
0
h-index:
0
PHILIPP, HR
[J].
SOLID STATE COMMUNICATIONS,
1966,
4
(01)
: 73
-
&
[10]
OPTICAL PROPERTIES OF NON-CRYSTALLINE SI, SIO, SIOX AND SIO2
PHILIPP, HR
论文数:
0
引用数:
0
h-index:
0
PHILIPP, HR
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1971,
32
(08)
: 1935
-
&
←
1
2
→
共 18 条
[1]
MEASUREMENT OF OXYGEN ADSORPTION ON SILICON BYELLIPSOMETRY
ARCHER, RJ
论文数:
0
引用数:
0
h-index:
0
ARCHER, RJ
GOBELI, GW
论文数:
0
引用数:
0
h-index:
0
GOBELI, GW
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1965,
26
(02)
: 343
-
&
[2]
OPTICAL MEASUREMENT OF FILM GROWTH ON SILICON AND GERMANIUM SURFACES IN ROOM AIR
ARCHER, RJ
论文数:
0
引用数:
0
h-index:
0
ARCHER, RJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1957,
104
(10)
: 619
-
622
[3]
SPECTROSCOPIC ANALYSIS OF THE INTERFACE BETWEEN SI AND ITS THERMALLY GROWN OXIDE
ASPNES, DE
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
ASPNES, DE
THEETEN, JB
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
THEETEN, JB
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(06)
: 1359
-
1365
[4]
Berning PH, 1963, PHYS THIN FILMS, V1, P69
[5]
Heavens O.S, 1991, OPTICAL PROPERTIES T
[6]
SILICON CLEANING WITH HYDROGEN PEROXIDE SOLUTIONS - HIGH ENERGY ELECTRON DIFFRACTION AND AUGER ELECTRON SPECTROSCOPY STUDY
HENDERSON, RC
论文数:
0
引用数:
0
h-index:
0
HENDERSON, RC
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(06)
: 772
-
+
[7]
OXIDATION OF SI AND GAAS IN AIR AT ROOM-TEMPERATURE
LUKES, F
论文数:
0
引用数:
0
h-index:
0
LUKES, F
[J].
SURFACE SCIENCE,
1972,
30
(01)
: 91
-
&
[8]
PANTELIDES ST, 1978, PHYSICS SIO2 ITS INT
[9]
OPTICAL TRANSITIONS IN CRYSTALLINE AND FUSED QUARTZ
PHILIPP, HR
论文数:
0
引用数:
0
h-index:
0
PHILIPP, HR
[J].
SOLID STATE COMMUNICATIONS,
1966,
4
(01)
: 73
-
&
[10]
OPTICAL PROPERTIES OF NON-CRYSTALLINE SI, SIO, SIOX AND SIO2
PHILIPP, HR
论文数:
0
引用数:
0
h-index:
0
PHILIPP, HR
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1971,
32
(08)
: 1935
-
&
←
1
2
→