SYNTHESIS AND PROPERTIES OF MICROLAMINATE STRUCTURES BY ION-BEAM-ASSISTED DEPOSITION

Films of Al, Al2O3, Mo and MoSi(x) Were formed by ion beam assisted deposition (IBAD) at R ratios between 0.004 and 0.1 and film thicknesses between 150 and 1100 nm. Al films were crystalline with a strong (111) fiber texture becoming more pronounced and azimuthally oriented with increasing R ratio. Mo films were crystalline with strong (110) texture and a distinct azimuthal texture indicative of planar channeling of the ion beam along (110) planes. The microstructure of Al films is characterized by large columnar grains at R = 0 with breakup starting at R = 0.04, while that of Mo films showed little change with increasing R ratio. Al2O3 and MoSi(x) films are amorphous under all deposition conditions. The average stress in oxide and silicide films is tensile at R = 0 and becomes compressive with increased values of the normalized energy, saturating at approximately 15 eV/atom. The average stress in Mo films is tensile at R = 0, increases to a maximum value of 0.63 GPa and becomes compressive with increasing normalized energy.