REACTIVE SPUTTER DEPOSITION - A QUANTITATIVE-ANALYSIS

被引：53
作者：
HOHNKE, DK
SCHMATZ, DJ
HURLEY, MD
机构：
来源：
THIN SOLID FILMS | 1984年 / 118卷 / 03期
关键词：
D O I：
10.1016/0040-6090(84)90201-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：301 / 310
页数：10
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