OXIDATION TEMPERATURE-DEPENDENCE OF THE DC ELECTRICAL-CONDUCTION CHARACTERISTICS AND DIELECTRIC STRENGTH OF THIN TA2O5 FILMS ON SILICON

被引：110
作者：
OEHRLEIN, GS
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 05期
关键词：
D O I：
10.1063/1.336468
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：1587 / 1595
页数：9
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