INSITU GROWTH OF YBCO HIGH-TC SUPERCONDUCTING THIN-FILMS BY PLASMA-ENHANCED METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：14

作者：

ZHAO, J

CHERN, CS

LI, YQ

NOH, DW

NORRIS, PE

ZAWADZKI, P

KEAR, B

GALLOIS, B

机构：

[1] RUTGERS STATE UNIV,PISCATAWAY,NJ 08854

[2] STEVENS INST TECHNOL LIB,HOBOKEN,NJ 07030

来源：

JOURNAL OF CRYSTAL GROWTH | 1991年 / 107卷 / 1-4期

关键词：

D O I：

10.1016/0022-0248(91)90544-F

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Highly c-axis oriented, highly dense, low carbon YBa2Cu3O(x) superconducting thin films have been formed in-situ at a reduced substrate temperature as low as 570-degrees-C by a novel plasma enhanced metalorganic chemical vapor deposition process. Superconducting YBa2Cu3O(x) thin films, having a zero resistance transition temperature of 82 K and critical current density of 10(4) A/cm2 at 70 K, have been directly deposited on sapphire substrates by such a process.

引用

页码：699 / 704

页数：6

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