ADSORBATE-INDUCED CHANGES IN THE INFRARED REFLECTANCE AND RESISTIVITY OF METALS

被引:40
|
作者
LIN, KC
TOBIN, RG
DUMAS, P
HIRSCHMUGL, CJ
WILLIAMS, GP
机构
[1] MICHIGAN STATE UNIV,DEPT PHYS & ASTRON,E LANSING,MI 48824
[2] MICHIGAN STATE UNIV,CTR FUNDAMENTAL MAT RES,E LANSING,MI 48824
[3] CTR UNIV PARIS SUD,UTILISAT RAYONNEMENT ELECTROMAGNET LAB,F-91405 ORSAY,FRANCE
[4] CNRS,SPECTROCHIM INFRAROUGE & RAMAN LAB,F-94320 THIAIS,FRANCE
[5] YALE UNIV,DEPT APPL PHYS,NEW HAVEN,CT 06520
[6] BROOKHAVEN NATL LAB,NATL SYNCHROTRON LIGHT SOURCE,UPTON,NY 11973
来源
PHYSICAL REVIEW B | 1993年 / 48卷 / 04期
关键词
D O I
10.1103/PhysRevB.48.2791
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present an experimental test of a predicted relationship between adsorbate-induced changes in the infrared reflectance and dc resistivity of a metal. We have measured the absolute change in reflectance for O and CO on Cu(100) and for CO on Ni(100) over the frequency range 300-2000 cm-1 and compared it with published resistivity changes for the corresponding thin-film systems. For the two adsorbates on Cu the results are consistent with a simple model based on scattering of conduction electrons by the adsorbate. For CO on Ni, however, the reflectance change is much smaller than predicted.
引用
收藏
页码:2791 / 2794
页数:4
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