STM STUDY OF GE OVERLAYERS ON SI(001)

被引:30
|
作者
IWAWAKI, F
TOMITORI, M
NISHIKAWA, O
机构
[1] Department of Materials Science and Engineering, The Graduate School at Nagatsuta, Tokyo Institute of Technology, Midori-ku, Yokohama, 227
关键词
D O I
10.1016/0039-6028(92)91034-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The structures of microscopically small Ge islands on the Si(001) surface were observed by an ultrahigh vacuum scanning tunneling microscope. After the Ge deposition of 0.1-0.2 monolayer (ML) on the Si substrate at 300-degrees-C, Ge islands composed of 1-5 dimer rows were observed. The observed structures indicated that the ordered arrangement of the buckled dimer rows varies with the number of dimer rows and that the position of a buckled Ge dimer has an interesting correlation with the position of a substrate Si dimer. A Ge dimer row separated by a missing dimer alternately was also observed. The stability of the Ge dimer row is discussed.
引用
收藏
页码:285 / 288
页数:4
相关论文
共 50 条
  • [1] Comparative STM and RHEED studies of Ge/Si(001) and Si/Ge/Si(001) surfaces
    Goldfarb, I
    Briggs, GAD
    SURFACE SCIENCE, 1999, 433 : 449 - 454
  • [2] STM STUDY OF EPITAXIAL-GROWTH OF GE ON SI(001)
    IWAWAKI, F
    TOMITORI, M
    NISHIKAWA, O
    SURFACE SCIENCE, 1991, 253 (1-3) : L411 - L416
  • [3] STM STUDY OF THE GE GROWTH MODE ON SI(001) SUBSTRATES
    TOMITORI, M
    WATANABE, K
    KOBAYASHI, M
    NISHIKAWA, O
    APPLIED SURFACE SCIENCE, 1994, 76 (1-4) : 322 - 328
  • [4] STM STUDY OF INITIAL-STAGE OF GE EPITAXY ON SI(001)
    IWAWAKI, F
    TOMITORI, M
    NISHIKAWA, O
    ULTRAMICROSCOPY, 1992, 42 : 902 - 909
  • [5] STM STUDY OF GEOMETRIC AND ELECTRONIC-STRUCTURES OF GE DIMERS ON SI(001)
    IWAWAKI, F
    KATO, H
    TOMITORI, M
    NISHIKAWA, O
    ULTRAMICROSCOPY, 1992, 42 : 895 - 901
  • [6] ELONGATED DIMER STRUCTURE FOR GE OVERLAYERS ON SI(001) - SYMMETRICAL OR ASYMMETRIC
    OYANAGI, H
    SAKAMOTO, K
    SHIODA, R
    SAKAMOTO, T
    JOURNAL OF CRYSTAL GROWTH, 1995, 150 (1-4) : 926 - 930
  • [7] Strain-induced atomic rearrangements in Ge overlayers on Si(001)
    Oyanagi, H
    Sakamoto, K
    Shioda, R
    JOURNAL DE PHYSIQUE IV, 1997, 7 (C2): : 669 - 673
  • [8] THERMAL ETCHING OF SI(001) - A STM STUDY
    MUNZ, AW
    ZIEGLER, C
    GOPEL, W
    SURFACE SCIENCE, 1995, 325 (1-2) : 177 - 184
  • [9] EVIDENCE FOR STRAIN-INDUCED SURFACE REARRANGEMENT - GE EPITAXIAL OVERLAYERS ON SI(001)
    OYANAGI, H
    SAKAMOTO, K
    SHIODA, R
    SAKAMOTO, T
    PHYSICA B, 1995, 208 (1-4): : 443 - 444
  • [10] THE INTERACTION OF SB OVERLAYERS WITH SI(001)
    SLIJKERMAN, WFJ
    ZAGWIJN, PM
    VANDERVEEN, JF
    GRAVESTEIJN, DJ
    VANDEWALLE, GFA
    SURFACE SCIENCE, 1992, 262 (1-2) : 25 - 32