PRECIPITATION IN FE-DOPED SEMI-INSULATING INP EPITAXIAL LAYER GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION (MOCVD)

被引:17
作者
CHU, SNG
NAKAHARA, S
LONG, JA
RIGGS, VG
JOHNSTON, WD
机构
[1] AT&T Bell Lab, Murray Hill, NJ,, USA, AT&T Bell Lab, Murray Hill, NJ, USA
关键词
IRON AND ALLOYS;
D O I
10.1149/1.2113667
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The authors report the observation of small coherent precipitates in Fe-doped semi-insulating InP epitaxial layer grown by MOCVD on S-doped (001) InP substrate. Within the iron concentration range of 3 multiplied by 10**1**7 to 2 multiplied by 10**1**9 cm** minus **3, the density of precipitate increases with increasing iron concentration, while the size of precipitates (100-250A) remains more or less constant. These are identified as FeP. Due to the differences in lattice structures, precipitation of FeP instead of FeP//2 observed in bulk crystal can be rationalized in terms of the minimization of the misfit strain energy. Occasionally, slip-type dislocation structures were observed associated with the precipitates.
引用
收藏
页码:2795 / 2798
页数:4
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