HIGHLY REPRODUCIBLE FABRICATION TECHNOLOGY FOR PASSIVATED ALGAAS/GAAS HETEROJUNCTION BIPOLAR-TRANSISTORS WITH PT/TI/PT/AU BASE ELECTRODES

被引:1
|
作者
HONGO, S
SUGIYAMA, T
KURIYAMA, Y
IIZUKA, N
OBARA, M
机构
[1] Toshiba Research and Development Center, Saiwai-ku Kawasaki, 210, 1, Komukai Toshiba-cho
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1995年 / 34卷 / 2B期
关键词
HETEROJUNCTION BIPOLAR TRANSISTOR; HBT; SURFACE PASSIVATION; PASSIVATED HBT; ALGAAS; PT; SELECTIVE ETCHING; CITRIC ACID;
D O I
10.1143/JJAP.34.1181
中图分类号
O59 [应用物理学];
学科分类号
摘要
A highly reproducible fabrication technology for passivated heterojunction bipolar transistors (HBT's) has been developed. A thermally stable Pt/Ti/Pt/Au base electrode metal penetrates through the Al0.3Ga0.7As emitter layer to contact the base layer. This feature leads to the formation of the base passivation layer. A citric-acidbased selective etchant eliminates the ambiguity of etching and thus confirms the reproducibility of passivation layer thickness. The excess base leakage current density was reduced to about 1 mu A/mu m.
引用
收藏
页码:1181 / 1184
页数:4
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