CHANNELED SUBSTRATE BURIED HETEROSTRUCTURE INGAASP/INP LASER EMPLOYING A BURIED FE ION IMPLANT FOR CURRENT CONFINEMENT

被引：24
作者：
WILT, DP
SCHWARTZ, B
TELL, B
BEEBE, ED
NELSON, RJ
机构：
来源：
APPLIED PHYSICS LETTERS | 1984年 / 44卷 / 03期
关键词：
D O I：
10.1063/1.94728
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：290 / 292
页数：3
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