HIGH-TEMPERATURE OPERATION OF SILICON-CARBIDE MOSFET

被引:18
作者
KONDO, Y
TAKAHASHI, T
ISHII, K
HAYASHI, Y
SAKUMA, E
MISAWA, S
DAIMON, H
YAMANAKA, M
YOSHIDA, S
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 02期
关键词
D O I
10.1143/JJAP.26.310
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:310 / 311
页数:2
相关论文
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YOSHIDA, S .
IEEE ELECTRON DEVICE LETTERS, 1986, 7 (07) :404-406
[3]  
NISHINO S, 1984, 16TH INT C SOL STAT, P8
[4]   HIGH-TEMPERATURE ELECTRICAL-PROPERTIES OF 3C-SIC EPITAXIAL LAYERS GROWN BY CHEMICAL VAPOR-DEPOSITION [J].
SASAKI, K ;
SAKUMA, E ;
MISAWA, S ;
YOSHIDA, S ;
GONDA, S .
APPLIED PHYSICS LETTERS, 1984, 45 (01) :72-73