ISLAND-SIZE SCALING IN SURFACE DEPOSITION PROCESSES

被引：60

作者：

BARTELT, MC

TRINGIDES, MC

EVANS, JW

机构：

[1] IOWA STATE UNIV SCI & TECHNOL,AMES LAB,AMES,IA 50011

[2] IOWA STATE UNIV SCI & TECHNOL,DEPT PHYS,AMES,IA 50011

[3] IOWA STATE UNIV SCI & TECHNOL,DEPT MATH,AMES,IA 50011

来源：

PHYSICAL REVIEW B | 1993年 / 47卷 / 20期

关键词：

D O I：

10.1103/PhysRevB.47.13891

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Diffusion-mediated nucleation and growth of islands during deposition occurs essentially irreversibly in a variety of systems. We provide a scaling theory for the full island-size distribution, both with the ratio of surface diffusion to deposition rates and with time. Scaling functions and exponents are determined by simulation and explained analytically by an unconventional rate-equation analysis. Experimental tests for theoretical predictions are discussed, including the scaling of superlattice beam profiles for diffraction studies of heteroepitaxial systems.

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页码：13891 / 13894

页数：4

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