DEEP UV LITHOGRAPHY

被引：177

作者：

LIN, BJ ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.568527

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1317 / 1320

页数：4

共 8 条

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[4]

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[8] PHOTOLITHOGRAPHIC CONTACT PRINTING OF 4000A LINEWIDTH PATTERNS [J].

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