DEEP UV LITHOGRAPHY

被引：176
作者：
LIN, BJ [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期
关键词：
D O I：
10.1116/1.568527
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1317 / 1320
页数：4
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