TRANSPARENT CONDUCTING ZINC-OXIDE AND INDIUM TIN OXIDE-FILMS PREPARED BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING

被引：55

作者：

MANIV, S ^{[1
]}

MINER, CJ ^{[1
]}

WESTWOOD, WD ^{[1
]}

机构：

[1] BELL NO RES,OTTAWA K1Y 4H7,ONTARIO,CANADA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 03期

关键词：

D O I：

10.1116/1.572024

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1370 / 1375

页数：6

共 17 条

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[10] HIGH-RATE DEPOSITION OF TRANSPARENT CONDUCTING FILMS BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING OF CD2SN ALLOY [J].

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