LOW-TEMPERATURE ATMOSPHERIC-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TITANIUM DISULFIDE FILMS

被引：20
作者：
WINTER, CH [1 ]
LEWKEBANDARA, TS [1 ]
PROSCIA, JW [1 ]
机构：
[1] FORD MOTOR CO,DIV GLASS,DEARBORN,MI 48120
来源：
CHEMISTRY OF MATERIALS | 1992年 / 4卷 / 06期
关键词：
D O I：
10.1021/cm00024a007
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：1144 / 1146
页数：3
相关论文
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