SILICON SILICON INTERACTION IN BIS(SILYLENE)IRON, DISILANYLIRON, AND BIS(SILYL)IRON COMPLEXES

被引:23
作者
UENO, K [1 ]
TOBITA, H [1 ]
OGINO, H [1 ]
机构
[1] TOHOKU UNIV,FAC SCI,DEPT CHEM,AOBA KU,SENDAI,MIYAGI 980,JAPAN
关键词
D O I
10.1016/0022-328X(92)80099-J
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
Si-29 NMR coupling constants in a disilanyliron complex CpFe(CO)2SiMe2SiMe(OtBu)2 (1: cp = eta-5-C5H5), a bis(silylene)iron complex Cp(OC)Fe{SiMe2...O((t)Bu)...SiMeOtBu} (2), and a cis-bis(silyl)iron complex (OC)4Fe{SiMe2CH2CH2SiMePh} (3) were measured by the INEPT-INADEQUATE technique. The coupling constant for 2 (28.6 Hz) is much smaller than that for 1 (128 Hz) with a direct Si-Si bond, but larger than that for 3 (2.7 Hz) where there is no direct Si-Si bond. Model calculations using the extended Huckel method indicate that there is no direct bond between the two silicon atoms in the bis(silylene)iron complex Cp(OC)Fe{SiH2...O(H)...SiH2}. This means that the coupling in 2 can be described as the sum of the two geminal couplings, 2J(SiFeSi) and 2J(SiOSi).
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页码:93 / 104
页数:12
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