REPEATED REMOVAL OF THIN-LAYERS OF SILICON BY ANODIC-OXIDATION

被引：35

作者：

BARBER, HD

LO, HB

JONES, JE

机构：

[1] LINEAR TECHNOL INC,BURLINGTON,ONTARIO,CANADA

[2] MCMASTER UNIV,DEPT ENGN PHYS,HAMILTON 16,ONTARIO,CANADA

[3] BOWMAR CANADA LTD,OTTAWA,ONTARIO,CANADA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 09期

关键词：

D O I：

10.1149/1.2133085

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1404 / 1408

页数：5

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