EFFECT OF HEAT-TREATMENT ON THE PROPERTIES OF GALLIUM-IMPLANTED POLYCRYSTALLINE SILICON

被引：3
|
作者：
HARRISON, HB
KOMEN, Y
CAO, DX
POGANY, AP
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 09期
关键词：
D O I：
10.1063/1.99820
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：746 / 748
页数：3
相关论文
共 50 条
  • [1] GALLIUM-IMPLANTED SILICON
    WAGH, AG
    SARMA, N
    BHATTACHARYA, PK
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1975, 32 (01): : 63 - 68
  • [2] Effects of Vacuum Annealing on Mechanical Properties of Gallium-implanted Silicon Nanowires
    Fujii, Tatsuya
    Namazu, Takahiro
    Sudoh, Koichi
    Miura-Fujiwara, Eri
    SENSORS AND MATERIALS, 2019, 31 (03) : 683 - 695
  • [3] HEAT-TREATMENT EFFECT ON BORON IMPLANTATION IN POLYCRYSTALLINE SILICON
    LEE, CH
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (07) : 1604 - 1607
  • [4] EFFECT OF HEAT-TREATMENT ON RESISTIVITY OF POLYCRYSTALLINE SILICON FILMS
    FRIPP, AL
    IEEE TRANSACTIONS ON PARTS HYBRIDS AND PACKAGING, 1975, 11 (03): : 239 - 240
  • [5] EFFECT OF HEAT-TREATMENT ON BORON IMPLANTATION IN POLYCRYSTALLINE SILICON
    LEE, CH
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C97 - C97
  • [6] ND-YAG LASER ANNEALING OF GALLIUM-IMPLANTED SILICON
    TAKAI, M
    TSOU, SC
    TSIEN, PH
    ROSCHENTHALER, D
    RYSSEL, H
    APPLIED PHYSICS, 1981, 24 (04): : 319 - 322
  • [7] EFFECT OF HEAT-TREATMENT ON ELECTRICAL-PROPERTIES OF ION-IMPLANTED SILICON ON SAPPHIRE
    JASTRZEBSKI, L
    SMELTZER, RK
    CULLEN, GW
    LAGOWSKI, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (06) : 1375 - 1378
  • [8] EFFECT OF HEAT-TREATMENT ON THE ADSORPTION PROPERTIES OF POLYCRYSTALLINE ZINC
    DANILOV, AI
    BATRAKOV, VV
    SAFONOV, VA
    SOVIET ELECTROCHEMISTRY, 1980, 16 (01): : 90 - 93
  • [9] EFFECT OF HEAT-TREATMENT ON REDISTRIBUTION OF HYDROGEN IN DIRECTIONALLY CAST POLYCRYSTALLINE SILICON
    KUMAR, R
    KOTNALA, RK
    ARORA, NK
    DAS, BK
    APPLIED PHYSICS LETTERS, 1988, 52 (20) : 1670 - 1671
  • [10] THE EFFECT OF HEAT-TREATMENT ON REDISTRIBUTION OF FAST DIFFUSING IMPURITIES IN POLYCRYSTALLINE SILICON
    KUMAR, R
    KOTNALA, RK
    ARORA, NK
    DAS, BK
    JOURNAL OF APPLIED PHYSICS, 1988, 64 (02) : 942 - 944
12345