CHEMICAL VAPOR-DEPOSITION OF METALS FOR INTEGRATED-CIRCUIT APPLICATIONS

被引:56
作者
GREEN, ML
LEVY, RA
机构
来源
JOURNAL OF METALS | 1985年 / 37卷 / 06期
关键词
D O I
10.1007/BF03257716
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
引用
收藏
页码:63 / 71
页数:9
相关论文
共 50 条
[41]   CHEMICAL VAPOR-DEPOSITION OF SILANES [J].
JONSSON, U ;
OLOFSSON, G ;
MALMQVIST, M ;
RONNBERG, I .
THIN SOLID FILMS, 1985, 124 (02) :117-123
[42]   FUNDAMENTALS OF CHEMICAL VAPOR-DEPOSITION [J].
BRYANT, WA .
JOURNAL OF MATERIALS SCIENCE, 1977, 12 (07) :1285-1306
[43]   LASERS IN CHEMICAL VAPOR-DEPOSITION [J].
不详 .
SOLID STATE TECHNOLOGY, 1973, 16 (07) :12-12
[44]   CHEMICAL VAPOR-DEPOSITION IN MICROELECTRONICS [J].
KURNIK, RT .
CHEMICAL ENGINEERING PROGRESS, 1985, 81 (05) :30-35
[45]   METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].
MILLER, LM ;
COLEMAN, JJ .
CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1988, 15 (01) :1-26
[46]   DIAMOND CHEMICAL VAPOR-DEPOSITION [J].
BACHMANN, PK ;
LEERS, D ;
WIECHERT, DU .
JOURNAL DE PHYSIQUE IV, 1991, 1 (C2) :907-913
[47]   INTRODUCTION TO CHEMICAL VAPOR-DEPOSITION [J].
HAMMOND, ML .
SOLID STATE TECHNOLOGY, 1979, 22 (12) :61-65
[48]   LASER CHEMICAL VAPOR-DEPOSITION [J].
ROY, SK .
BULLETIN OF MATERIALS SCIENCE, 1988, 11 (2-3) :129-135
[49]   REMOTE PLASMA CHEMICAL VAPOR-DEPOSITION OF COPPER FOR APPLICATIONS IN MICROELECTRONICS [J].
LI, HW ;
EISENBRAUN, ET ;
KALOYEROS, AE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (04) :1337-1340
[50]   CHEMICAL VAPOR-DEPOSITION OF GAAS FOR SOLAR-CELL APPLICATIONS [J].
DEBERNARDY, R ;
DONAGHEY, LF .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (08) :C264-C264